Comparison between the optical properties of TiO2 and ZnO thin films deposited using Dc plasma sputtering and pulsed laser deposition

Document Type : Original Article

Authors

1 Ministry of Electricity, Iraq

2 Depertment of physics, Faculty of science, Benha University, P. O. Box13518 Benha, Egypt

3 Department of physics, Faculty of science, Babylon University, Babylon, Iraq

Abstract

TiO2 and ZnO thin films were deposited using two different techniques, DC magnetron plasma sputtering and pulsed
laser deposition, on glass substrates at different powers. The optical properties concerning the absorption, reflection and
transmission spectra were studied for the deposited thin films. Noticeable enhancement for all optical properties was
noticed for PLD thin films. The surface morphology of the deposits materials has been studied using atomic force
microscope (AFM). The average surface roughness increasing from 3 by sputtering to 7 by PLD for TiO2 thin films and
from 1 by sputtering to 9 by PLD for ZnO thin films.

Keywords

Journal of Basic and Environmental Sciences
Volume 5, Issue 2
April 2018
Pages 93-100

Files

Share

How to cite

Statistics